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smartmotion raith sectors by enabling a wide variety of applications for industry and academia we enable building their digital future explore how nanotechnology enables your business optical telecommunication consumer electronics research rapid prototyping semiconductors defense space quantum technologies materials science life sciences our insights photonics sectors solutions our nanofabrication solutions pave the way from breakthrough innovations and rapid prototyping to volume production of nanotechnology devices patterning digital raith mix and match holography workflow process control solutions products our unique combination of high precision writing imaging and analysis tools is designed to meet the most demanding requirements in the field providing unparalleled precision and efficiency electron beam lithography focused ion beams laser lithography imaging analysis explore electron beam lithography the crucial technology for generating nanostructures essential in shaping tomorrow s devices particularly in semiconductors optoelectronics and quantum technologies product overview ebpg highest throughput automation and precision voyager high performance for shortest time to result pioneer e line raith150 multifunctional system family for maximum versatility elphy upgrade kit for sem or fib sem experience ion beams across various fields with our fib sem nanofabrication ion microscopy and sims nanoanalytics systems product overview velion multi ion species fib sem ionmaster sims analysis for high resolution nm scale elemental mapping elphy upgrade kit for sem or fib sem discover laser lithography with multi beam technology for enhanced throughput and scalable resolution or choose single beam systems with unmatched lateral and gray level resolutions product overview picomaster direct laser writers with ultimate resolution picomaster xf highest throughput grayscale lithography athos light years ahead in optical security and holographic packaging explore precise imaging and analysis tools for enhanced understanding and progress offering a wide range of capabilities from large area 3d imaging to comprehensive process control and extensive material analysis product overview chipscanner large area 3d sem imaging ionmaster sims analysis for high resolution nm scale elemental mapping vector ai powered inspection and metrology electron beam lithography ebpg voyager pioneer e line raith150 elphy focused ion beams velion ionmaster elphy laser picomaster picomaster xf athos imaging analysis ionmaster chipscanner vector products technologies we continually push the boundaries of nanotechnology a commitment we take very seriously over the past four decades our intense focus and dedication have led to numerous groundbreaking innovations exploring the depths of nanotechnology ultrapositioning ionselect smartmotion magsims perfectshapes fasthr autorun proimage optifly infinitrace easyswitch rapidtrace holosuite technologies services the worldwide sales and service structure is backed by dedicated experts in our international application and development centers global departments and local factories work hand in hand service contracts services contacts updates upgrades service on demand service contact form services company we are a global nanotech solutions provider defined by progress about us career downloads vision mission news micrograph award sustainability events contact us locations representatives references company search login contact smart motion smartmotion technology was developed to provide a solution to avoid stitching errors through stitch free exposure on the fly raith technologies smartmotion introduction some lithography applications especially the writing of optical devices such as waveguides or gratings are extremely sensitive to minimal unsteadiness or roughness within the pattern even the tiniest hint of a noticeable stitch field border can cause significant degradation in device performance despite the use of a highly precise laser stage and sophisticated write field corrections very small stitching and transition errors at write field boundaries cannot be completely eliminated writing continuously with sub nanometer precision requires very accurate and smooth mechanical motion key features continuous movement for stitch free patterning in contrast to conventional writing strategies the stage is continuously moving while the sample is exposed as a consequence step and repeat and classical stitching is replaced by a smooth transition along the patterning path smooth and precise motion raith s ultrapositioning technology with special emphasis on smooth and accurate motion for on the fly applications provides steady and disturbance free movement with minimal velocity fluctuations and following errors even very low velocities of a few micrometers per seconds or less are possible without disturbing slip stick effects real time motion controller a specially developed motion controller with exceptionally high update rates for path and deviation calculations drives the stage in controlled path mode simultaneously a direct high speed interface to the dedicated pattern generator ensures synchronized patterning and instant corrections of remaining mechanical errors via beam deflection two dedicated modes for writing with a continuously moving stage fbms exposure allows continuous writing of elongated straight or curved paths such as optical waveguides without stitching while the unique mbms modulated beam moving stage exposure mode aims at patterning of stitch free periodic structures such as photonic crystals or gratings benefits for applications applicable with two different writing modes fbms mbms in our electron beam lithography and fib systems writing of large photonic devices as optical waveguides stitch free fbms exposure paths can be several millimeters to centimeters long while maintaining lateral dimensions from below 20 nm to some micrometers with minimum line edge roughness and high uniformity ideal for periodic patterns fabrication mbms supports patterning strip shaped periodic structures such as gratings and lattices with ultrafine pitch adjustment optical devices like elongated bragg gratings or photonic crystal waveguides benefit from the absence of classical stitching boundaries in this writing mode fully integrated into nanosuite software both exposure modes are supported by the nanosuite software and fully compatible with the built in gdsii cad file editor efficiency throughput of large area patterning can be increased as acceleration and settling times are avoided due to the continuous process and movement of the stage how it works precision in motion achieving sub nanometer writing accuracy successful writing with continuously moving stage down to sub nanometer precision requires very accurate and smooth mechanical motion extremely fast path calculations as well as instant corrections of any following error therefore a laser stage based on raith s ultrapositioning technology is combined with a very fast motion controller specifically developed for this purpose the motion controller calculates a two dimensional continuous trajectory with stable velocity and drives the stage in closed loop control based on interferometer feedback highly accurate linear bearings and a special drive chain ensure very smooth and continuous movement of the laser stage and the sample disturbances and deviations that cannot be mechanically corrected in time due to the inertia of the stage are instantly compensated by beam deflection called beam tracking this is realized by a direct interface between the motion controller and pattern generator which is also used for patterning synchronization advanced beam tracking for enhanced patterning control beam tracking continuously superposes further beam deflections depending on the dedicated exposure mode fbms fixed beam and moving stage in fbms mode the width of the path is defined by dynamic beam expansion the beam remains virtually stationary while the stage underneath follows arbitrary shaped paths of the desired patterns mbms modulated beam and moving stage for mbms exposures the stage is driving straight paths and a feedforward correction is applied to the pattering the repetitive periodic beam movement is defined such that the combination of patterning and synchronized continuous movement of the laser interferometer stage results in the designed periodic structures the mbms implementation allows excellent pitch control by means of stage velocity control in combination with beam deflection mbms modulated beam and moving stage traxx fbms technology 0 31 min video fixed beam moving stage fbms unique continuous writing mode for ebl and fib 2 17 min video mbms for raith periodixx periodic patterning without stitching errors for ebl and ibl 0 43 min video modulated beam moving stage mbms periodic patterning without stitching errors 1 47 min video experience smartmotion voyager high performance for shortest time to result pioneer e line raith150 multifunctional system family for maximum versatility velion multi ion species fib sem need support for a specific application consult an expert want to experience our system first hand request a demo sign up for our newsletter hp name submit contact us send a message follow us on social media sectors optical telecommunication semiconductors quantum technologies consumer electronics life sciences defense space materials science photonics research rapid prototyping solutions patterning mix and match process control digital raith holography workflow products electron beam lithography focused ion beams laser lithography imaging analysis legal notice impressum privacy policy datenschutzerklärung 2024 raith gmbh headline this is a basic text element headline this is a basic text element close search advanced search any post type downloads events insights jobs pages posts products references sectors solutions technologies 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